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Advances in electrical and electronic engineering.

Žilinská univerzita. Electrotechnická fakulta, issuing body.; Vysoká škola báňská--Technická univerzita Ostrava, issuing body. 2002]-

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SÚČASNÝ STAV A VÝVOJOVÉ TRENDY V ELEKTROTECHNICKOM PRIEMYSLE SLOVENSKA

Kulla, Marián

Acta Geographica Universitatis Comenianae, 2013, Vol.57(1), pp.31-49 [Peer Reviewed Journal]

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MERANIE A SPRACOVANIE IMPULZOVEJ ODOZVY RADIOVEHO KANALA POMOCOU SEST-BRANOVEHO REFLEKTOMETRA/PULSE RESPONSE MEASUREMENT AND PROCESSING BY SIX-PORT REFLECTOMETER

Majer, Norbert ; Haring, Ján ; Poloha, Peter ; Wieser, Vladimír

Science & Military Journal, 2008, Vol.3(1), pp.14-17

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DETEKCIA NEBEZPECNYCH OBJEKTOV S VYUZITIM INFRACERVENYCH SYSTEMOV/DETECTION OF DANGER OBJECTS BY INFRARED SYSTEMS

Bréda, Róbert

Science & Military Journal, 2008, Vol.3(2), pp.48-50

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The shot-peened surface of AA 5083 under the influence of elevated temperature

Zivkovic, D ; Bajic, D ; Maric, G Zivkovic, D (correspondence author)

Kovove Materialy, 2007, Vol.45(5), pp.263-267 [Peer Reviewed Journal]

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Basic Principles of Variation Calculus

Vagaska, Alena ; Uram, Vladimir ; Kochanik, Jan Vagaska, Alena (correspondence author)

Manufacturing Engineering / Vyrobne Inzinierstvo, 2004, Vol.3(4), pp.69-73

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Neural modelling of a Tinning Line's Technological Part

Zilkova, J ; Timko, J Zilkova, J (correspondence author)

Acta Metallurgica Slovaca, 2006, Vol.12(3), pp.282-290 [Peer Reviewed Journal]

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P-Xylene as Parent for Special Polymers

Polievka, M ; Sojka, J ; Olos, M Polievka, M (correspondence author)

Ropa Uhlie, 1986, Vol.28(7), pp.400-404

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Plasma etching of materials for semiconductor structures and devices

Guldan, A ; Luby, S ; Hrkut, P ; Kubek, J Guldan, A (correspondence author)

Ceskoslovensky Casopis pro Fyziku, Sekce A, 1979, Vol.29(5), pp.468-475

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Phase characteristics of bilaterally tuned radio frequency bandpass filters

Zrubec, V Zrubec, V (correspondence author)

Slaboproudy Obzor, Jan. 1976, Vol.37, pp.11-18

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